![Alexandra L. McClelland](https://cdn.zonebourse.com/static/resize/768/576//static/images/insiders/unknown.png)
Alexandra L. McClelland
Corporate Officer/Principal presso Irresistible Materials Ltd.
Relazioni attive
Nome | Sesso | Età | Società collegate | Collaborazione |
---|---|---|---|---|
Alex Robinson | M | - |
Irresistible Materials Ltd.
![]() Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | 14 anni |
David Alexander Ure | M | - |
Irresistible Materials Ltd.
![]() Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | 14 anni |
Mark Shepherd | M | - |
Irresistible Materials Ltd.
![]() Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | - |
Daniel Armbrust | M | - |
Irresistible Materials Ltd.
![]() Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | - |
David Coleman | M | - |
Irresistible Materials Ltd.
![]() Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | - |
Patrick Wilmerding | M | - |
Irresistible Materials Ltd.
![]() Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | - |
Alan Brown | M | - |
Irresistible Materials Ltd.
![]() Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | 11 anni |
Mark Volanthen | M | - |
Irresistible Materials Ltd.
![]() Irresistible Materials Ltd. Electronics/AppliancesConsumer Durables Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom. | - |
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Statistiche
Paese | Relazioni | % del totale |
---|---|---|
Regno Unito | 8 | 100.00% |
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