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Charles M. McKenna
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Storia della carriera di Charles M. McKenna
Precedenti posizioni note di Charles M. McKenna
Società | Posizione | Inizio | Fine |
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Ibis Technology Corp.
![]() Ibis Technology Corp. SemiconductorsElectronic Technology Ibis Technology Corp. develops, manufactures and markets SIMOX-SOI implantation equipment for the worldwide semiconductor industry. SIMOX creates an insulating oxide barrier below the top surface of a silicon wafer through implantation and annealing. The company's proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. It was founded in October 1987. | Presidente | 01/05/2005 | 30/11/2007 |
AZENTA, INC. | Direttore Tecnico/Scientifico/R&S | 01/01/2000 | 01/01/2003 |
Statistiche
Distribuzione geografica
Stati Uniti | 3 |
Posizioni
Chief Tech/Sci/R&D Officer | 1 |
President | 1 |
Settori
Health Services | 2 |
Electronic Technology | 2 |
Posizioni ricoperte
Attive
Inattive
Società quotate in Borsa
Aziende private
Società collegate
Società quotate in Borsa | 1 |
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AZENTA, INC. | Health Services |
Aziende private | 1 |
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Ibis Technology Corp.
![]() Ibis Technology Corp. SemiconductorsElectronic Technology Ibis Technology Corp. develops, manufactures and markets SIMOX-SOI implantation equipment for the worldwide semiconductor industry. SIMOX creates an insulating oxide barrier below the top surface of a silicon wafer through implantation and annealing. The company's proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. It was founded in October 1987. | Electronic Technology |
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